by Anton Shilov
08/22/2013 | 11:26 PM
Toshiba Corp. on Thursday held a groundbreaking ceremony in readiness for the start of construction of Fab 5/phase 2, the company's state-of-the-art fabrication facility (fab) at its Yokkaichi Operations memory production facility in Mie Prefecture. The fab will be complete in mid-2014 and will likely begin operations one year after that.
The new fab 5/phase 2 will be a five floors steel frame concrete building. With phase 2 operations, the total floor area of the fab 5 will be 187 000m2. Toshiba will expand Fab 5 to secure manufacturing space for NAND flash memories fabricated with next generation process technology and for 3D memories. Construction will be completed in summer next year, and decisions on equipment investments and production levels will reflect market trends.
Three fabs at Yokkaichi Operations currently mass produce NAND flash memories, including Fab 5 phase 1. Fab 5's construction was planned around two phases, the first of which went into operation in July 2011. After giving careful consideration to the balance of product supply and demand, and noting a recovery driven by growing demand for smartphones, tablets, SSD for enterprise servers, Toshiba now anticipates further medium- to long-term market expansion and recognizes that the time is right to expand Fab 5.
Going forward, Toshiba will expand business and boost competitiveness by leadership in advanced process technology and the development of new generation memories that answer market needs.