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Infineon + AMD + Dupont Photomasks. [05/16/2002 11:50 PM]
by Anna Filatova
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Infineon Technologies, AMD and DuPont Photomasks, Inc. today announced plans to establish and operate a new advanced photomask facility in Dresden. The facility will be used to develop and pilot-manufacture next-generation lithographic photomasks for exposing patterns on semiconductor silicon wafers. For this purpose, the three companies are creating a new, equally-owned joint venture, Advanced Mask Technology Center GmbH & Co. KG (AMTC). The AMTC facility will be co-located with a new commercial photomask production facility that DuPont Photomasks will establish in Dresden as a separate entity.

The building, which is planned to house the two companies, has a useable floor space of 17,500 square meters. It will be constructed in the immediate vicinity of Infineon’s and AMD’s Dresden-based semiconductor fabs. The completion date for construction is scheduled for early 2003. As soon as the building is in place, AMTC and DuPont Photomasks plan to install the necessary equipment and begin start-up of the operations in the second half of 2003. Investments for the AMTC are estimated at around EUR 360 million over the next 5 years. AMTC expects to employ approximately 170 people. Key engineers from all three companies are expected to staff the AMTC and will collaboratively develop a roadmap for technology nodes of 90/65 nanometers and below.

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